Plasma Etcher Model PE 2000, 115/230 VAC

$43,995.00 (as of August 15, 2017, 9:36 pm)
Plasma-Etcher-Model-PE-2000-115230-VAC-0

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Product Description

Designed for reactive gas plasma etching and surface treatment. The unit is capable of 150 watts RF forward power at 13.56 MHz and up to four gas processing. Ideal for single sample processing. Samples up to 6″.

Additional Information

Brand

Electron Microscopy Sciences

Label

Electron Microscopy Sciences

Manufacturer

Electron Microscopy Sciences

MPN

55310

NumberOfItems
PackageQuantity
PartNumber

55310

ProductGroup

BISS

ProductTypeName

LAB_SUPPLY

Publisher

Electron Microscopy Sciences

Studio

Electron Microscopy Sciences

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